Simplified multi-threshold voltage scheme for fully depleted soi mosfets

ABSTRACT

A method for semiconductor fabrication includes providing channel regions on a substrate including at least one Silicon Germanium (SiGe) channel region, the substrate including a plurality of regions including a first region and a second region. Gate structures are formed for a first n-type field effect transistor (NFET) and a first p-type field effect transistor (PFET) in the first region and a second NFET and a second PFET in the second region, the gate structure for the first PFET being formed on the SiGe channel region. The gate structure for the first NFET includes a gate material having a first work function and the gate structures for the first PFET, second NFET and second PFET include a gate material having a second work function such that multi-threshold voltage devices are provided.

BACKGROUND

1. Technical Field

The present invention relates to semiconductor device fabrication, andmore particularly to a simplified multi-threshold voltage scheme forfully depleted semiconductor-on-insulator MOSFETs.

2. Description of the Related Art

The threshold voltage for a field effect transistor (FET), for example ametal-oxide-semiconductor (MOSFET), is the gate voltage necessary toinitiate conduction. Conventional approaches to offer multi-thresholdvoltage devices on fully depleted MOSFETs (metal-oxide-semiconductorfield-effect transistor), such as ETSOIs (extremely thinsemiconductor-on-insulator) or FinFETs (fin field effect transistors),are based on a combination of: gate length modulation, channel doping,work function adjustment and, in the case of thin BOX (buried oxide)FDSOI (fully depleted semiconductor-on-insulator) devices, a backbias orbackgate doping. However, each of these approaches has drawbacks. Forexample, gate length modulation offers a maximum of about 50 mV ofthreshold voltage modulation for typical device dimensions, sincelithography techniques to define different gate lengths limit the devicepitch. Channel doping leads to random dopant fluctuation. Work functionadjustment requires multiple gate stacks to be integrated, which inpractice is very challenging. Backbias and/or backgate doping offers amaximum of about 100 mV of threshold voltage modulation with typical BOXthicknesses of 20 nm or more and is not useful for FinFETs.

SUMMARY

A method for semiconductor fabrication includes providing channelregions on a substrate including at least one Silicon Germanium (SiGe)channel region, the substrate including a plurality of regions includinga first region and a second region. Gate structures are formed for afirst n-type field effect transistor (NFET) and a first p-type fieldeffect transistor (PFET) in the first region and a second NFET and asecond PFET in the second region, the gate structure for the first PFETbeing formed on the SiGe channel region. The gate structure for thefirst NFET includes a gate material having a first work function and thegate structures for the first PFET, second NFET and second PFET includea gate material having a second work function such that multi-thresholdvoltage devices are provided.

A method for semiconductor fabrication includes providing channelregions on a substrate including at least one Silicon Germanium (SiGe)channel region, the substrate including a plurality of regions includinga low threshold voltage (LVT) region and a high threshold voltage (HVT)region. Gate structures are formed for a first complementarymetal-oxide-semiconductor (CMOS) device including a first n-type fieldeffect transistor (NFET) and a first p-type field effect transistor(PFET) in the LVT region and a second CMOS device including a secondNFET and a second PFET in the HVT region, the gate structure for thefirst PFET being formed on the SiGe channel region. The gate structurefor the first NFET includes a gate material having a quartergap workfunction and the gate structures for the first PFET, second NFET andsecond PFET include a gate material having a midgap work function suchthat multi-threshold voltage devices are provided.

A semiconductor device includes a substrate having a plurality ofregions including a first region and a second region. Channel regionsformed on the substrate include at least one Silicon Germanium (SiGe)channel region. Gate structures are formed for a first n-type fieldeffect transistor (NFET) and a first p-type field effect transistor(PFET) in the first region and a second NFET and a second PFET in thesecond region, the gate structure for the first PFET being formed on theSiGe channel region. The gate structure for the first NFET includes agate material having a first work function and the gate structures forthe first PFET, second NFET and second PFET include a gate materialhaving a second work function such that multi-threshold voltage devicesare provided.

These and other features and advantages will become apparent from thefollowing detailed description of illustrative embodiments thereof,which is to be read in connection with the accompanying drawings.

BRIEF DESCRIPTION OF DRAWINGS

The disclosure will provide details in the following description ofpreferred embodiments with reference to the following figures wherein:

FIG. 1 is a cross-sectional view of a semiconductor structure having asilicon-on-insulator layer formed over a buried oxide layer, inaccordance with one illustrative embodiment;

FIG. 2 is a cross-sectional view of the semiconductor structure of FIG.1 after formation of shallow trench isolation regions and channelregions, including a silicon germanium channel region, in accordancewith one illustrative embodiment;

FIG. 3 is a cross-sectional view of the semiconductor structure of FIG.2 having gate structures formed in regions of the substrate, inaccordance with one illustrative embodiment;

FIG. 4 is a cross-sectional view of a semiconductor structure having asemiconductor-on-insulator layer formed over a buried oxide layer, inaccordance with one illustrative embodiment;

FIG. 5 is a cross-sectional view of the semiconductor structure of FIG.4 after formation of fins, in accordance with one illustrativeembodiment;

FIG. 6 is a cross-sectional view of the semiconductor structure of FIG.5 having gate structures formed around the fins, in accordance with oneillustrative embodiment;

FIG. 7 is a cross-sectional view of a semiconductor structure having asemiconductor-on-insulator layer formed over a buried oxide layer, inaccordance with one illustrative embodiment;

FIG. 8 is a cross-sectional view of the semiconductor structure of FIG.7 after formation of shallow trench isolation regions, channel regionsand pockets, in accordance with one illustrative embodiment;

FIG. 9 is a cross-sectional view of the semiconductor structure of FIG.8 having gate structures formed on the substrate, in accordance with oneillustrative embodiment; and

FIG. 10 is a block/flow diagram showing a system/method for formingmulti-threshold voltage devices, in accordance with one illustrativeembodiment.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

In accordance with the present principles, methods for fabricating asemiconductor device having a multi-threshold voltage scheme and devicesthereof are provided. A multilayer substrate is provided, which mayinclude an extremely thin semiconductor-on-insulator, ultrathin body andburied oxide (BOX), etc. Channel regions are formed on the substrate,including at least one Silicon Germanium channel region. In someembodiments, forming the channel regions may include forming fins as thechannel regions. The substrate may include a plurality of regions,including a first low threshold voltage region, which may be for, e.g.,logic, and a second high threshold voltage region, which may be for,e.g., memory (e.g., static random access memory (SRAM)). Additionalregions may be employed for additional threshold voltages, such as,e.g., regular threshold voltage regions.

The logic region may include a first complementarymetal-oxide-semiconductor (CMOS) device, including a first n-type fieldeffect transistor (NFET) and a first p-type field effect transistor(PFET). The SRAM region may include a second CMOS device, including asecond NFET and a second PFET. Gate structures for the first and secondCMOS devices are formed. Preferably, the gate structure for the firstPFET is formed above the Silicon Germanium channel region.

Gate materials are selectively employed to provide a desired workfunction. Preferably, the first NFET includes a gate material having afirst work function and the first PFET, second NFET and second PFETinclude a gate material having a second work function. The first workfunction may include a quartergap work function and the second workfunction may include a midgap work function.

The present principles provide for a multi-threshold voltage scheme. Thethreshold voltage shift for logic PFET is provided by a combination ofthe Silicon Germanium channel and the work function. For SRAM devices,the same work function is applied but with a Silicon channel to providea higher threshold voltage.

It is to be understood that the present invention will be described interms of a given illustrative architecture having a wafer; however,other architectures, structures, substrate materials and processfeatures and steps may be varied within the scope of the presentinvention.

It will also be understood that when an element such as a layer, regionor substrate is referred to as being “on” or “over” another element, itcan be directly on the other element or intervening elements may also bepresent. In contrast, when an element is referred to as being “directlyon” or “directly over” another element, there are no interveningelements present. It will also be understood that when an element isreferred to as being “connected” or “coupled” to another element, it canbe directly connected or coupled to the other element or interveningelements may be present. In contrast, when an element is referred to asbeing “directly connected” or “directly coupled” to another element,there are no intervening elements present.

A design for an integrated circuit chip may be created in a graphicalcomputer programming language, and stored in a computer storage medium(such as a disk, tape, physical hard drive, or virtual hard drive suchas in a storage access network). If the designer does not fabricatechips or the photolithographic masks used to fabricate chips, thedesigner may transmit the resulting design by physical means (e.g., byproviding a copy of the storage medium storing the design) orelectronically (e.g., through the Internet) to such entities, directlyor indirectly. The stored design is then converted into the appropriateformat (e.g., GDSII) for the fabrication of photolithographic masks,which typically include multiple copies of the chip design in questionthat are to be formed on a wafer. The photolithographic masks areutilized to define areas of the wafer (and/or the layers thereon) to beetched or otherwise processed.

Reference in the specification to “one embodiment” or “an embodiment” ofthe present principles, as well as other variations thereof, means thata particular feature, structure, characteristic, and so forth describedin connection with the embodiment is included in at least one embodimentof the present principles. Thus, the appearances of the phrase “in oneembodiment” or “in an embodiment”, as well any other variations,appearing in various places throughout the specification are notnecessarily all referring to the same embodiment.

It is to be appreciated that the use of any of the following “/”,“and/or”, and “at least one of”, for example, in the cases of “A/B”, “Aand/or B” and “at least one of A and B”, is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of both options (A andB). As a further example, in the cases of “A, B, and/or C” and “at leastone of A, B, and C”, such phrasing is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of the third listedoption (C) only, or the selection of the first and the second listedoptions (A and B) only, or the selection of the first and third listedoptions (A and C) only, or the selection of the second and third listedoptions (B and C) only, or the selection of all three options (A and Band C). This may be extended, as readily apparent by one of ordinaryskill in this and related arts, for as many items listed.

Methods as described herein may be used in the fabrication of integratedcircuit chips. The resulting integrated circuit chips can be distributedby the fabricator in raw wafer form (that is, as a single wafer that hasmultiple unpackaged chips), as a bare die, or in a packaged form. In thelatter case the chip is mounted in a single chip package (such as aplastic carrier, with leads that are affixed to a motherboard or otherhigher level carrier) or in a multichip package (such as a ceramiccarrier that has either or both surface interconnections or buriedinterconnections). In any case the chip is then integrated with otherchips, discrete circuit elements, and/or other signal processing devicesas part of either (a) an intermediate product, such as a motherboard, or(b) an end product. The end product can be any product that includesintegrated circuit chips, ranging from toys and other low-endapplications to advanced computer products having a display, a keyboardor other input device, and a central processor.

Referring now to the drawings in which like numerals represent the sameor similar elements and initially to FIG. 1, a semiconductor structure100 is illustratively depicted in accordance with one embodiment. Thesemiconductor structure 100 is formed in a semiconductor substrate 102,which may include bulk silicon, monocrystalline silicon, germanium,gallium arsenide, or any other suitable material or combination ofmaterials. Substrate 102 preferably includes a buried oxide (BOX) layer105 and a silicon-on-insulator (SOI) layer 106 formed in or on substrate102.

The substrate 102 may include a fully depleted SOI 106 with thick BOX104, such as, e.g., extremely thin SOI (ETSOI). BOX layer 102 ispreferably a thick BOX layer, e.g., at or about 150-200 nm, but may alsoinclude other thicknesses. BOX layer 104 may include silicon dioxide,silicon nitride, or any other suitable material. SOI layer 106 ispreferably an extremely thin SOI, e.g., at or about 2-10 nm, but mayalso include other thicknesses. SOI layer 106 may include any suitablesemiconductor such as, e.g., silicon, germanium, silicon germanium, agroup III-V semiconductor such as, e.g., gallium arsenide, a group II-VIsemiconductor, etc. In some embodiments, the semiconductor structure 100further comprises other features or structures that are formed inprevious process steps.

Referring now to FIG. 2, processing of the semiconductor structure 100continues. The semiconductor device includes a first region 112 and asecond region 114. The first region 112 may include a low thresholdvoltage (LVT) region, such as, e.g., a logic region where timing is aconstraint. The second region 114 may include a high threshold voltage(HVT) region, such as, e.g., a memory (e.g., static random access memory(SRAM)) region where leakage power is a constraint. It should beunderstood that semiconductor structure 100 may include any number ofregions, in accordance with the present principles. For example, thesemiconductor structure 100 may include a third region including aregular threshold voltage (RVT) region, such as, e.g., a logic region.

Shallow trench isolation (STI) dielectric regions 108 are formed byconventional methods to electrically separate devices and reduceparasitic currents and charge buildup. STI regions 108 may include anoxide, e.g., a silicon oxide.

Silicon Germanium (SiGe) layer 110 is formed from a portion of SOI layer106. SiGe has a valence band shift when compared to Silicon (Si) thatlowers the threshold voltage of p-type field effect transistors (PFETs)by about 200 mV for typical Germanium (Ge) concentration, compared toSilicon devices. In one embodiment, SiGe layer 110 is formed by etchingthe Silicon, leaving about, e.g., 2-4 nm, and epitaxially growing SiGe.In another embodiment, SiGe layer 110 is formed by epitaxially growingSiGe on SOI layer and diffusing Ge atoms into the Si layer with athermal process. In yet another embodiment, SiGe layer 110 is formed byepitaxially growing SiGe on SOI layer and thermal oxidation. During thisprocess Silicon atoms are oxidized leaving behind Ge atoms that diffuseinto the SOI layer. Other techniques for forming SiGe layer 110 may alsobe employed within the scope of the present principles.

Referring now to FIG. 3, processing of the semiconductor structure 100is continued. Devices 116 and 118 are formed in the logic region 112 anddevices 120 and 122 are formed in the SRAM region 114. Additionaldevices may also be formed in the logic region 112 and SRAM region 114.Preferably, devices 116 and 118 and devices 120 and 122 arecomplementary metal-oxide-semiconductors (CMOS) devices, which includean NFET (n-type field effect transistor) device and a PFET device. In apreferred embodiment, devices 116 and 120 include NFETs and devices 118and 122 include PFETs. The PFET device 118 of the logic region 112(e.g., the LVT region) is preferably formed over SiGe layer 110 (shownin FIG. 2). Devices 116, 120 and 122 are preferably formed over Silicon(Si) layer 106.

Gate structures for devices 116, 118, 120, 122 are formed. The gatestructures include gate dielectrics 124 and gate electrodes 126, 128.The gate dielectric 126 may include a silicon oxide, silicon nitride,silicon oxynitride, organic dielectric, etc. In a preferred embodiment,gate dielectric 126 includes a high dielectric constant material, suchas, e.g., metal oxides such as hafnium oxide, hafnium silicon oxide,hafnium silicon oxynitride, lanthanum oxide, lanthanum aluminum oxide,zirconium oxide, zirconium silicon oxide, zirconium silicon oxynitride,tantalum oxide, titanium oxide, barium strontium titanium oxide, bariumtitanium oxide, strontium titanium oxide, yttrium oxide, aluminum oxide,lead scandium tantalum oxide, lead zinc niobate, any suitablecombination of those high-k materials, or any suitable combination ofany high-k material with silicon oxide, silicon nitride, and/or siliconoxynitride.

Gate electrodes 126, 128 may be formed of a gate material associatedwith a desired work function. The work function of a material is thedifference between the vacuum energy level and the Fermi energy level ofthe material. For example, in one embodiment, the gate electrodes may beformed of a low work function material, such as, e.g., polysilicon dopedwith an n-type material (e.g., Phosphorus, etc.), resulting in arelatively lower threshold voltage of an NFET. The gate electrodes mayalso be formed of a high work function material, such as, e.g.,polysilicon doped with a p-type material (e.g., Boron, Boron Fluoride,etc.) or a metal (e.g., tungsten, titanium, tantalum, ruthenium,zirconium, cobalt, copper, aluminum, lead, platinum, tin, silver, gold),resulting in a relatively higher threshold voltage of an NFET. The gateelectrodes may be formed of any other suitable material or combinationof materials, in accordance with a desired work function.

In a preferred embodiment, the gate electrode 126 of NFET device 116includes a gate material having a first work function WF1, while thegate electrode 128 of PFET device 118 includes a gate material having asecond work function WF2. NFET device 116 is formed on Silicon layer106, which may be strained or unstrained. PFET device 118 is formed onSiGe layer 110, which is preferably strained however may be unstrained.

Gate electrodes 128 of NFET device 120 and PFET device 122 preferablyinclude a gate material having WF2. NFET device 120 and PFET device 122are formed on Silicon layer 106, which may be strained or unstrained. Itis noted that in a typical SRAM circuit, strain in the channel of PFETdevice 122 is completely relaxed if formed of SiGe. So the use of SiGefor PFET device 122 is not advantageous. In fact, smaller bandgap ofSiGe leads to higher band-to-band tunneling, which is not desired forleakage constrained devices such as memory or HVT devices. If HVTdevices are needed for logic region 112, they can use the same workfunction and channel used in devices in the SRAM region 114.

In a particularly useful embodiment, WF1 includes an n-type quartergapwork function and WF2 includes a midgap work function. The effectivework function of a quarter-gap device may be about 4.325 electron-volts(eV) and the effective work function of a midgap FET device may be about4.600 eV. Other work functions may also be employed within the scope ofthe present principles. The gate electrodes 126 and 128 and gatedielectric 124 may be formed by either a gate-first or gate-lastprocess.

In a gate-first process, a typical quarter-gap work function materialmay include, e.g., titanium nitride (TiN) formed on hafnium oxide orhafnium silicate gate dielectric. A mid-gap work function material maybe formed by inserting, e.g., an aluminum containing layer over thehigh-k dielectric or in the TiN material.

In a gate-last process, a gate having a quarter-gap work function may beformed by using, e.g., aluminum gate metal and a lanthanum (La)containing threshold voltage adjusting layer. In this case a mid-gapmaterial may be obtained by using a relatively thin (e.g., less than 4angstrom) La containing layer. Other suitable materials and processes toform quarter-gap and mid-gap work function materials may also beemployed. Processing of the semiconductor structure 100 may continue,e.g., to form spacers, source/drain regions, etc.

The SiGe channel of PFET device 118 gives a roughly 200-300 mV thresholdvoltage reduction compared to Silicon channel and midgap WF2. Thethreshold voltage reduction can be controlled by the concentration ofthe Ge atoms in the SiGe layer. In one embodiment, the Ge concentrationin SiGe layer is preferably 20-30%. Devices of SRAM region 114 having anundoped Silicon channel and midgap WF2 give a long channel thresholdvoltage of around 500 mV corresponding to a short channel offsetcurrent, I_(off), of about 100 pA/um for a typical device withreasonable threshold voltage roll-off of less than 100 mV andsub-threshold swing of around 80 mV. Devices of logic region 112 have along channel threshold voltage of around 300 mV, corresponding to ashort channel offset current of around 10 nA/um with typical deviceroll-off. It should be understood that threshold voltage may further beadjusted by employing conventional approaches. For example, about 50 mVthreshold voltage adjustment can be obtained with gate length modulationor channel doping.

It is noted that the present principle may be applied to otherstructures. For example, the present principles may be applied to formmulti-threshold voltage devices on SOI FinFETs (fin field effecttransistors), as illustratively depicted in FIGS. 4-6. In anotherexample, the present principles may be applied to form multi-thresholdvoltage devices on UTBB (ultrathin body and BOX), as illustrativelydepicted in FIGS. 7-9. Other applications are also contemplated.

Referring now to FIG. 4, a semiconductor structure 200 is illustrativelydepicted in accordance with one embodiment. The present principles areapplied to form multi-threshold voltage devices on FinFETs. Thesemiconductor structure 200 is formed on a substrate 202, whichpreferably includes a BOX layer 204 and an SOI layer 206 formed in or onsubstrate 202. In some embodiments, the substrate 202 may also includeother features or structures formed in or on the semiconductor substratein previous process steps.

Referring now to FIG. 5, processing on the semiconductor structure 200is continued. The semiconductor structure 200 includes a first region212 and a second region 214. The first region 212 may include a LVTregion, such as, e.g., a logic region where timing is a constraint. Thesecond region 214 may include an HVT region, such as, e.g., an SRAMregion where leakage power is a constraint. Additional regions are alsocontemplated, such as, e.g., an RVT region.

Mandrels 208 are formed on the BOX layer 204 in the logic region 212 andSRAM region 214. Mandrels 208 preferably include fins. Additional finsmay also be formed in the logic region 212 and SRAM region 214. Fins 208may be formed using a lithographic process that may include a resistlayer (not shown) and lithographic patterning. In some embodiment,patterning of the fins 208 may be performed using a side-wall imagetransfer (SIT), directional self-assembly (DSA), or any suitable methodcapable of producing dimensions smaller than the minimum feature sizeachievable by lithographic patterning.

Fin 210 preferably includes a SiGe fin. SiGe mandrel 210 may be formedby thinning the SOI layer and epitaxially growing SiGe, growing SiGe anddiffusing Ge atoms, or by epitaxially growing SiGe followed by oxidationto diffuse Ge atoms into Si. Other techniques for forming SiGe mandrel210 may also be employed.

Referring now to FIG. 6, devices are formed. Devices 216 and 218 areformed in the logic region 212 and devices 220 and 222 are formed in theSRAM region 214. Additional devices may be formed in the logic region212 and SRAM region 214. Preferably, devices 216 and 218 and devices 220and 222 are device pairs, such as, e.g., CMOS, which include NFETs 216and 220 and PFETs 218 and 222. PFET 218 of the logic region 212 ispreferably formed over SiGe mandrel 210 (shown in FIG. 5).

Gate structures for devices 216, 218, 220, 222 are formed, which includegate dielectrics 224 and gate electrodes 226, 228. Gate electrodes 226,228 are formed of a gate material associated with a desired workfunction. In a preferred embodiment, gate electrode 226 of NFET device216 includes a gate material having WF1, while gate electrodes 228 ofPFET devices 218, 222 and NFET device 220 include a gate material havingWF2. Preferably, WF1 includes an n-type quartergap work function and WF2includes a midgap work function. Other work functions may also beemployed.

The SiGe channel of PFET device 218 gives a roughly 200-300 mV thresholdvoltage reduction compared to Silicon channel and midgap WF2. Devices inSRAM region 214 provide a long channel threshold voltage of around 500mV and devices in logic region 212 provide a long channel thresholdvoltage of around 300 mV, in accordance with one embodiment.

Referring now to FIG. 7, a semiconductor structure 300 is illustrativelydepicted in accordance with one embodiment. The present principles areapplied to form multi-threshold voltage devices on FDSOI devices withthin BOX, such as ultrathin body and BOX (UTBB), having additionalthreshold voltage regions. The semiconductor structure 300 is formed ina semiconductor substrate 302, which may include a BOX layer 304 and SOIlayer 306. BOX layer 304 is preferably a thin BOX layer, e.g., at orabout 10-25 nm, but may also include other thicknesses (e.g., ultrathin,etc.). SOI layer 106 is preferably an ultrathin SOI layer, e.g., at orabout 2-10 nm, but may also include other thicknesses. In someembodiments, the semiconductor structure 100 further comprises otherfeatures or structures that are formed in previous process steps.

Referring now to FIG. 8, processing of the semiconductor structure 300is continued. The semiconductor structure 300 includes a first region316, a second region 318 and a third region 320. The first region 316may include a LVT region, such as, e.g., a logic region where timing isa constraint. The second region 318 may include a RVT region, such as,e.g., a logic region. The third region 320 may include a HVT region,such as, e.g., an SRAM region where leakage power is a constraint.

SiGe layers 308 are formed in portions of SOI layer 306. Forming SiGelayers 308 may include, for example, etching Si and growing SiGe, ordiffusing Ge atoms into the Si layer, etc. Other techniques for formingSiGe layers 308 may also be employed.

Pockets 312, 313, 314 are formed under BOX layer 304 by implantation.Pockets 312, 313, 314 provide for the further adjustment of thresholdvoltage. Formation of pockets 312, 313, 314 may include forming a resistpattern (not shown) to protect portions of the substrate 302 andemploying ion implantation to implant dopants into unprotected portionsof substrate 302.

N-type dopants are implanted in pockets 312 at an implant dose rangefrom, e.g., 10¹³/cm² to 10¹⁶/cm², with an implant energy range from,e.g., 5 KeV to 200 KeV, depending on the implant species. N-type dopantsmay include, e.g., phosphorous, arsenic, etc. P-type dopants areimplanted in pockets 314 at an implant dose range from, e.g., 10¹³/cm²to 10¹⁶/cm², with an implant energy range from, e.g., 5 KeV to 200 KeV,depending on the implant species. P-type dopants may include, e.g.,boron, boron fluoride, etc. Pockets 313 may include either n-type orp-type dopants, depending on the desired threshold voltage for the SRAMdevices.

An n-type pocket reduces the threshold voltage of NFET and increases thethreshold voltage of PFET. Similarly, a p-type pocket increases thethreshold voltage of NFET and reduces the threshold voltage of PFET.Everything else being same, the difference in the threshold voltage of atransistor with n-type pocket compared to a transistor with p-typepocket is about 80-100 mV for a typical BOX thickness of 20-25 nm.

Ion implantation includes bombarding into substrate 302 with ions atangles of approximately 5 degrees to about 75 degrees with respect to avertical-normal to a major surface of the device. Other angles of attackmay also be employed. The parameters of the ion implantation may beadjusted to provide a desired dopant level.

STI dielectric regions 310 are formed by conventional methods toelectrically separate devices and reduce parasitic currents and chargebuildup. It should be understood that STI regions 310 may be formedbefore and/or after the formation of pockets 312, 313, 314.

Referring now to FIG. 9, gate structures are formed on semiconductorstructure 300. Devices 322, 324 are formed in LVT logic region 316,devices 326, 328 are formed in RVT logic region 318, and devices 330,332 are formed in SRAM region 320. Additional devices and/or regions maybe formed. Preferably, devices 322 and 324, devices 326 and 328, anddevices 330 and 332 form CMOS devices including NFETs and PFETs. NFETsmay include devices 322, 326 and 330. PFETs may include devices 324, 328and 332. Devices 324 and 328 are preferably formed over SiGe layer 308.

Gate structures are formed including gate dielectrics 334 and gateelectrodes 336, 338. In a preferred embodiment, gate electrodes 336 ofNFET devices 322, 326 include a gate material having WF1, while gateelectrodes 338 of PFET devices 324, 328, 332 and NFET device 330 includea gate material having WF2. Preferably, WF1 includes an n-typequartergap work function and WF2 includes a midgap work function. Otherwork functions may also be employed.

The SiGe channel of PFET devices 324, 328 gives a roughly 200-300 mVthreshold voltage reduction compared to Silicon channel and midgap WF2.Backgate doping in implant pockets 312, 313, 314 gives roughly a 50-100mV threshold voltage alteration, depending on the thickness of the BOXlayer 304. Devices in LVT logic region 316 provide a long channelthreshold voltage of around 250 mV, devices in RVT logic region 318provide a long channel threshold voltage of around 350 mV, and devicesin SRAM region 320 provide a long channel threshold voltage of around500 mV, in accordance with one embodiment.

Referring now to FIG. 10, a block/flow diagram showing a method ofsemiconductor fabrication 400 is illustratively depicted in accordancewith one embodiment. In block 402, a semiconductor substrate isprovided. The substrate is preferably a multilayer substrate, including,e.g., SOI, ETSOI, UTBB, etc. In some embodiments, a top layer of thesubstrate may be processed to form mandrels, which may include fins. Thesubstrate may include a plurality of regions, including a first regionand a second region. The first region may be a low threshold voltageregion such as, e.g., a logic region. The second region may be a highthreshold voltage region such as, e.g., an SRAM region.

In block 404, channel regions are formed on the substrate, including atleast one SiGe channel region. Forming SiGe channel region may involve,e.g., etching the Si and epitaxially growing SiGe, diffusing Ge into theSi, etc. Other methods of forming SiGe channel region may also beemployed.

In block 406, gate structures are formed for first NFET and PFET devicesin the first region and second NFET and PFET devices in the secondregion. Gate structures are formed such that multi-threshold voltagedevices are provided. Gate structures include gate dielectrics and gateelectrodes. First NFET and PFET devices and second NFET and PFET devicespreferably include CMOS devices. In block 408, the gate structure forthe first PFET device is formed over the SiGe channel region, which ispreferably strained but may be unstrained.

In block 410, the gate structure for the first NFET devices includes agate material having a first work function and the gate structures forthe first PFET device and the second NFET and PFET devices include agate material having a second work function. In a preferred embodiment,the first work function includes a quartergap work function and thesecond work function includes a midgap work function.

It should be understood that additional regions may be employed having adifferent threshold voltage, in accordance with the present principles.For example, additional threshold voltage regions may be provided bybackgate doping. Other methods of altering threshold voltage may also beemployed, such as, e.g., gate length adjustment, channel doping, etc.

In one embodiment, the semiconductor substrate may also include a thirdregion for a regular threshold voltage for a logic region. The thirdregion may include a third NFET device having a gate material having thefirst work function and a third PFET device having a gate materialhaving the second work function. The third PFET device is preferablyformed over a SiGe channel region. Backgate doping is performed byforming pockets below the isolation (e.g., BOX) layer for each deviceformed on the substrate, e.g., by implantation. In the first region, thefirst NFET device includes a pocket doped with n-type dopants, and thefirst PFET device includes a pocket doped with p-type dopants. In thethird region, the third NFET device includes a pocket doped with p-typedopants and the third PFET device includes a pocket doped with n-typedopants. The second NFET and PFET devices include pockets doped with asame type of dopants (i.e., either both n-type or both p-type). Thisresults in a multi-threshold voltage scheme for each region of thesubstrate.

In block 412, additional processing is performed. This may include,e.g., forming spacers, source/drain regions, etc.

Having described preferred embodiments of a device and method offabrication thereof for simplified multi-threshold voltage scheme forfully depleted semiconductor-on-insulator MOSFETs (which are intended tobe illustrative and not limiting), it is noted that modifications andvariations can be made by persons skilled in the art in light of theabove teachings. It is therefore to be understood that changes may bemade in the particular embodiments disclosed which are within the scopeof the invention as outlined by the appended claims. Having thusdescribed aspects of the invention, with the details and particularityrequired by the patent laws, what is claimed and desired protected byLetters Patent is set forth in the appended claims.

What is claimed is:
 1. A method for semiconductor fabrication,comprising: forming a first PFET on the SiGe channel region; forming asecond PFET, a first NFET and a second NFET on a Si channel region;forming a first gate structure for the first NFET that includes a gateelectrode material having a first work function having a quartergap workfunction and comprising at least titanium and nitrogen; and forming asecond set of gate structures for the first PFET, second NFET and secondPFET that include a gate electrode material having a second workfunction having a midgap work function such that multi-threshold voltagedevices are provided.
 2. The method as recited in claim 1, wherein atleast one of the first PFET, second PFET, first NFET and second NFETcomprise a fin field effect transistor (FinFET).
 3. The method asrecited in claim 1, wherein the first NFET and the first PFET are in alow threshold voltage region of a substrate, and the second NFET and thesecond PFET and in a second region of the substrate that includes a highthreshold voltage region.
 4. The method as recited in claim 1, whereinthe SiGe channel region includes a concentration of Germanium in theSiGe channel region to adjust threshold voltage.
 5. The method asrecited in claim 1, wherein the first NFET and the first PFET form afirst complementary metal-oxide-semiconductor (CMOS) device and thesecond NFET and the second PFET form a second CMOS device.
 6. The methodas recited in claim 1, wherein providing SiGe channel region and the Sichannel are provided infin structures.
 7. The method as recited in claim1, further comprising forming gate structures for a third NFET and athird PFET in a third region of the substrate, the gate structure forthe third PFET being formed on a SiGe channel region.
 8. The method asrecited in claim 7, wherein the gate structure for the third NFETincludes a gate material having the first work function and the gatestructure for the third PFET includes a gate material having the secondwork function.
 9. The method as recited in claim 7, further comprisingforming pockets below an isolation layer of the substrate for eachdevice, wherein pockets for the first NFET and third PFET are doped withn-type dopants and pockets for the first PFET and the third NFET aredoped with p-type dopants.
 10. The method as recited in claim 9, whereinpockets for the second NFET and second PFET are doped with a same dopanttype.
 11. A method for semiconductor fabrication, comprising: providingchannel regions on a substrate including at least one Silicon Germanium(SiGe) channel region, the substrate including a plurality of regionsincluding a low threshold voltage (LVT) region and a high thresholdvoltage (HVT) region; and forming gate structures for a firstcomplementary metal-oxide-semiconductor (CMOS) device including a firstn-type field effect transistor (NFET) and a first p-type field effecttransistor (PFET) in the LVT region and a second CMOS device including asecond NFET and a second PFET in the HVT region, the gate structure forthe first PFET being formed on the SiGe channel region, wherein a firstgate structure of said gate structures for the first NFET includes agate electrode material having a first work function having a quartergapwork function and comprising at least titanium and nitrogen; and asecond set of gate structures of said gate structures for the firstPFET, second NFET and second PFET include a gate electrode materialhaving a second work function having a midgap work function such thatmulti-threshold voltage devices are provided.
 12. The method as recitedin claim 11, wherein providing channel regions includes forming fins asthe channel regions.
 13. The method as recited in claim 11, furthercomprising forming gate structures for a third NFET and a third PFET ina third region of the substrate, the gate structure for the third PFETbeing formed on a SiGe channel region.
 14. The method as recited inclaim 13, wherein the gate structure for the third NFET includes a gatematerial having the first work function and the gate structure for thethird PFET includes a gate material having the second work function. 15.The method as recited in claim 13, further comprising forming pocketsbelow an isolation layer of the substrate for each device, whereinpockets for the first NFET and third PFET are doped with n-type dopantsand pockets for the first PFET and the third NFET are doped with p-typedopants.
 16. The method as recited in claim 15, wherein pockets for thesecond NFET and second PFET are doped with a same dopant type.